Next-generation horizontal system for high-throughput 300 mm wafer processing
Horizontal batch-type process system for multifold applications
Vertical wafer process system for R&D and production of Si-based semiconductors
High-temperature furnace for the annealing of SiC and other materials in Ar, N2 and H2 ambient
High-temperature furnace for SiC oxidation and Pre / Post Oxidation Annealing
Rapid Thermal Processing system for silicon and compound semiconductors
Leading-edge PECVD technology for high-throughput solar cell deposition
Leading-edge LP diffusion technology for solar cell production
Most versatile multi plate vacuum soldering systems
Vacuum soldering systems for R&D and pilot scale production
Muffle furnace for Direct Copper Bonding (DCB)
Flexible conveyor belt furnace for R&D and high-volume production
High-temperature annealing and thermal treatment applications of wide band gap crystals
Low-pressure oxidation oven for carbon fiber precursor stabilization
Lab-scale continuous furnace for low-temperature fiber carbonization
Lab-scale ultra high-temperature furnace for continuous fiber graphitization
Conveyor belt furnace for ceramic high-temperature materials such as ceramic fibres
