c.DIFF X is centrotherm‘s well-established and highly versatile diffusion platform for a stable emitter formation in high-performance solar cell processing. The reliable low-pressure system is deployed both in p-type and in n-type c-Si solar cell manufacturing.
Equipped with 10 tubes and designed for wafer diameters up to 210 mm, c.DIFF X has particularly been developed for multi-GW producers of highefficiency p-type solar cells.
Thanks to its broad and flexible process capability and performance, c.DIFF X offers excellent and repeatable results regarding emitter homogeneity even at high sheet resistivities of 400 Ω/square. Unique advantages of the batch-type equipment are the flexibility towards varying production load and process sequence as well as the continued operation in case of single tube maintenance, shut-down or process optimization.
Depending on specific production requirements centrotherm provides various configurations, e.g. regarding operating pressure, capacity and automation level.
Processes
- (Low-Pressure) diffusion (POCl3, BCl3)
- Wet / dry oxidation (optional: DCE, HCl)
- Annealing (e.g. N2, H2)
- Further processes upon request
Options
- Silicon Carbide (SiC) process tubes and boat
Features & Benefits
- Excellent diffusion results on both wafer sides
- Exceptional emitter uniformities and high sheet resistance (400 Ω/square)
- Low media and utility consumption (≤ 50% BCl3 savings)
- Advanced water cooling system prevents thermal interference between different tubes
- Processing in independent tubes provides redundancy and high availability
- Highest cleanness (gas phase diffusion without residues)
- Rapid change of gas atmosphere allows to establish new diffusion recipes and to fine-tune emitter profiles
