HORIZONTAL
Horizontal batch-type process system for multifold applications
The centrotherm c.HORICOO 200 is a field-proven and ultra-versatile tube furnace system that is available for mass and medium volume production as well as for Research and Development.
It provides reliable process capabilities and high process performance for multiple applications, such as atmospheric and low pressure diffusion as well as LPCVD processes. The process tubes can be configured for various processes with associated facilities. Within one furnace atmospheric, LPCVD or mixed-tube configuration can be installed.
All furnaces can be equipped with an integrated boat handling system as well as an integrated wafer transfer system. Interference between individual tubes is minimized by water-cooled heating cassettes. The softlanding system enables repeatable wafer positioning within the tube, independent from wafer load. Ease of maintenance ensures low cost of ownership and a high uptime.
Processes
Atmospheric processes
- Wet and dry oxidation (DCE, HCl)
- Diffusion (e.g. POCl3, BBr3)
- Annealing (H2, N2)
- Activation annealing
- Contact sintering
- Curing
- Nitridation
- Silicidation
LPCVD processes
- Polysilicon and amorphous silicon
- Doped Polysilicon
- Silicon Nitride
- Low stress Nitride
- TEOS | PSG | BPSG
- LTO | HTO
- Oxynitride
- SIPOS
Special processes
- Low-pressure diffusion (POCl3)
- Gallium diffusion
- Aluminum pre-deposition/diffusion
Options
- Boat elevator and boat storages
- Integrated full automatic wafer transfer system
- Flowbox
Sales Semiconductor & Microelectronics
Tel. +49 7344 918 6794
E-Mail
Find us at
CS MANTECH
Hilton New Orleans Riverside | New Orleans, LA
Features & Benefits
Modular design for maximum flexibility
- Up to 5 stacked quartz or SiC process tubes
- Selectable process tube options available
- Quick and easy installation and start-up in clean room facilities
- Improved safety concepts according to SEMI standards
Advanced water cooling system
- No thermal interference between individual tubes
centrotherm CESAR II Software
- Modern touch operating HMI
- Remote control and maintenance possible
- All-in-one tube control
- SEMI-compliant recipe management
- Intuitive user-friendly GUI
Wafer sizes up to 200 mm
High process flexibility
Lowest total CoO
