RTP

Rapid Thermal Processing system for silicon and compound semiconductors

The stand-alone RTP system c.RAPID 200 has been especially developed for multiple process requirements in R&D and production lines. High performance and flexibility combined with low cost of ownership make it the best choice in rapid thermal processing.

The capability to run a substrate on a susceptor or within a box in combination with atmospheric or vacuum operation enables a wide range of possible applications for compound semiconductors (e.g. for SiC or GaN).

Its wafer surface-independent temperature controllability is unique among all existing RTP solutions. The pyrometer-based temperature measurement system enables processes at low and high temperatures. Independent lamp control combined with predictive PID control provides excellent thermal accuracy and repeatability.

c.RAPID 200 operates with a fully automatic loading system and is available as single or dual chamber version and with up to 4 cassette stations.

Processes

  • Rapid Thermal Annealing (RTA)
    - Ion implant annealing
    - Contact/metal anneal
    - Source/drain anneal
  • Rapid Thermal Oxidation (RTO)
  • Silicide formation (Ti, Co, Ni, Pt, etc.)
  • PSG reflow
  • Dopant activation

Sales Semiconductor & Microelectronics

Tel. +49 7344 918 6794
E-Mail

Find us at

ECSCRM
ECSCRM
Vinci International Convention Centre Tours, France

Features & Benefits

  • Ramp rate up to 40 K/s (150 mm silicon wafer within a box)
  • Side-by-side installation
  • Fully automated wafer handling

Uncompromising reliability

  • Pressure controlled vacuum or atmospheric operation
  • Excellent temperature uniformity
  • Precise ambient control

Maximum flexibility

  • Substrates up to 200 mm on susceptor or in boxes
  • Configurable with 2 process modules and up to 4 cassette stations
  • SMIF compatibility
Wafer sizes up to 200 mm

Wafer sizes up to 200 mm

Compound semiconductors

Compound semiconductors

Automated operation

Automated operation

Cookie notification: For the provision of our services we use technically necessary cookies. In addition, we use Google Analytics for the statistical analysis of anonymous user data to improve our offer.
Privacy policy | Imprint

This is the website of centrotherm international AG, Blaubeuren. If you are looking for the website of Centrotherm Systemtechnik GmbH, Brilon, Germany please click here. Please note that the two companies have no business connection with one another.