Equipment

Next-generation horizontal system for high-throughput 300 mm wafer processing

Horizontal batch-type process system for multifold applications

Vertical wafer process system for R&D and production of Si-based semiconductors

High-temperature furnace for the annealing of SiC and other materials in Ar, N₂ and H₂ ambient

High-temperature furnace for SiC oxidation and Pre / Post Oxidation Annealing

Rapid Thermal Processing system for silicon and compound semiconductors

Most versatile multi plate vacuum soldering systems

Vacuum soldering systems for R&D and pilot scale production

High-temperature annealing and thermal treatment applications of wide band gap crystals